Substrate cleaning method, substrate cleaning system, and memory medium

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United States of America Patent

PATENT NO 11367630
APP PUB NO 20200395230A1
SERIAL NO

17007085

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Abstract

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A method for cleaning a substrate includes supplying to a substrate on which a resist layer is not formed a film-forming processing liquid which includes a volatile component and forms a film on the substrate, forming a processing film on the substrate by solidifying or curing the film-forming processing liquid supplied on the substrate, and supplying to the substrate having the processing film a strip-processing liquid which strips the processing film from the substrate.

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Patent Owner(s)

Patent OwnerAddress
TOKYO ELECTRON LIMITED3-1 AKASAKA 5-CHOME MINATO-KU TOKYO 107-6325

International Classification(s)

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Aibara, Meitoku Koshi, JP 16 118
Kaneko, Miyako Nirasaki, JP 23 190
Kanno, Itaru Minato-ku, JP 54 745
Orii, Takehiko Nirasaki, JP 82 1252
Tanaka, Satoru Koshi, JP 341 3727
Tanouchi, Keiji Nirasaki, JP 19 110

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