Allyloxy derivative, resist underlayer forming composition using the same, and method of manufacturing resist underlayer and semiconductor device using the same

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United States of America Patent

PATENT NO 11366389
APP PUB NO 20210181636A1
SERIAL NO

16760908

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Abstract

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The present invention provides a resist underlayer forming composition, which is well in heat resistance and gap filling. Further, the present invention provides methods of manufacturing a resist underlayer and semiconductor device using it. [Means for Solution] A composition comprising a allyloxy derivative having a specific group and a solvent, and methods of manufacturing a resist underlayer and semiconductor device using it.

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MERCK PATENT GMBHDARMSTADT

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hama, Yusuke Kakegawa, JP 10 13
Matsuura, Yuriko Kakegawa, JP 10 26
Nakasugi, Shigemasa Yamato, JP 16 27
Sekito, Takashi Kakegawa, JP 20 58
Yanagita, Hiroshi Kakegawa, JP 37 135

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