System and method for generating and analyzing roughness measurements and their use for process monitoring and control
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United States of America Patent
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Jun 14, 2022
Grant Date -
Mar 18, 2021
app pub date -
Nov 24, 2020
filing date -
Apr 13, 2017
priority date (Note) -
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Abstract
A method is disclosed. The method includes receiving measured linescan information describing a pattern structure of a feature, applying the received measured linescan information to an inverse linescan model that relates measured linescan information to feature geometry information, identifying, based at least in part on the applying the received measured linescan model to the inverse linescan model, feature geometry information that describes a feature that would produce a linescan corresponding to the received measured linescan information, determining, at least in part using the inverse linescan model, feature edge positions of the identified feature, and analyzing the feature edge positions to detect the presence or absence of defects in the pattern structure.
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