System and method for error reduction for metrology measurements

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 11353799
APP PUB NO 20220155693A1
SERIAL NO

16928468

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A metrology system includes a controller communicatively coupled to one or more metrology tools, the controller including one or more processors configured to execute program instructions causing the one or more processors to receive one or more metrology measurements of one or more metrology targets of a metrology sample, a metrology target of the one or more metrology targets including one or more target designs with one or more cells, the one or more target designs being generated on one or more layers of the metrology sample; determine one or more errors based on the one or more metrology measurements; and determine one or more correctables to adjust one or more sources of error corresponding to the one or more errors, the one or more correctables being configured to reduce an amount of noise in the one or more metrology measurements generated by the one or more sources of errors.

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Patent Owner(s)

Patent OwnerAddress
KLA CORPORATIONONE TECHNOLOGY DRIVE MILPITAS CA 95035

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
BenDavid, Nir Migdal Ha'emek, IL 5 6
Dirawi, Rawi Nazareth, IL 2 9
Dror, Chen Tivon, IL 4 30
Golotsvan, Anna Qiryat Tivon, IL 14 24
Katz, Shlomit Beit Hanania, IL 2 3
Lahav, Oren Adi, IL 5 10
Manassen, Amnon Haifa, IL 128 1032
Volkovich, Roie Hadera, IL 35 61
Yerushalmi, Liran Zicron Yaacob, IL 26 82

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