Plasma processing apparatus having a focus ring adjustment assembly

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United States of America Patent

PATENT NO 11348767
APP PUB NO 20200365377A1
SERIAL NO

15930874

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Abstract

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A plasma processing apparatus is provided. The plasma processing apparatus includes a processing chamber defining a vertical direction and a lateral direction. The plasma processing apparatus includes a pedestal disposed within the processing chamber. The pedestal is configured to support the substrate. The plasma processing apparatus includes a radio frequency (RF) disposed within the processing chamber. The RF bias electrode defines a RF zone extending between a first end of the RF bias electrode and a second end of the RF bias electrode along the lateral direction. The plasma processing apparatus includes a focus ring disposed within the processing chamber. The plasma processing apparatus further includes a focus ring adjustment assembly. The focus ring adjustment assembly includes a lift pin positioned outside of the RF zone. The lift pin is movable along the vertical direction to adjust a distance between the pedestal and the focus ring along the vertical direction.

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Patent Owner(s)

Patent OwnerAddress
MATTSON TECHNOLOGY INC47131 BAYSIDE PARKWAY FREMONT CA 94538
BEIJING E-TOWN SEMICONDUCTOR TECHNOLOGY CO LTDNO 8 BUILDING NO 28 JINGHAI ER RD ECONOMIC AND TECHNICAL DEVELOPMENT ZONE BEJING 100176

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Lembesis, Peter J Boulder Creek, US 8 8
Ma, Shawming Sunnyvale, US 70 771
Pakulski, Ryan M Brentwood, US 17 83
Zucker, Martin L Orinda, US 15 1089

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