Polishing liquid and polishing method
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United States of America Patent
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May 24, 2022
Grant Date -
Dec 5, 2019
app pub date -
Aug 15, 2017
filing date -
Dec 22, 2016
priority date (Note) -
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Abstract
A polishing liquid is provided containing manganese oxide abrasive grains, permanganate ions, and a cellulosic surfactant or a cationic surfactant. The polishing liquid has a pH of 5 or more and 11 or less. The cellulosic surfactant is preferably a carboxymethyl cellulose or a derivative thereof. The cationic surfactant preferably has a quaternary ammonium ion site. The content of the cellulosic surfactant or the cationic surfactant is preferably 0.01 mass % or more and 1.0 mass % or less based on the total amount of the polishing liquid.
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