Method for treating a reflective optical element for the EUV wavelength range, method for producing same, and treating apparatus

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United States of America

PATENT NO 11328831
APP PUB NO 20190035512A1
SERIAL NO

16050541

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Abstract

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Treating a reflective optical element (104) for the EUV wavelength range that has a reflective coating on a substrate. The reflective optical element in a holder (106) is irradiated with at least one radiation pulse of a radiation source (102) having a duration of between 1 μs and 1 s. At least one radiation source (102) and the reflective optical element move relative to one another. Preferably, this is carried out directly after applying the reflective coating in a coating chamber (100). Reflective optical elements of this type are suitable in particular for use in EUV lithography or in EUV inspection of masks or wafers, for example.

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Patent Owner(s)

Patent OwnerAddress
CARL ZEISS SMT GMBHRUDOLF-EBER-STRASSE 2 OBERKOCHEN 73447

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Dier, Oliver Lauchheim, DE 13 33
Grasse, Christian Garching, DE 3 0
Hermann, Martin Heidenheim, DE 17 60
Hild, Kerstin Schwaebisch Gmuend, DE 18 31
Shklover, Vitaliy Heidenheim, DE 20 56
Six, Stephan Augsburg, DE 16 79
Strobel, Sebastian Aalen, DE 5 4
Weber, Joern Aalen, DE 10 26
Winter, Ralf Schwaebisch Gmuend, DE 11 10

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