Reticle with conductive material structure

Number of patents in Portfolio can not be more than 2000

United States of America

PATENT NO 11320733
APP PUB NO 20210026236A1
SERIAL NO

17066181

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Abstract

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A reticle, a reticle container and a method for discharging static charges accumulated on a reticle are provided. The reticle includes a mask substrate, a reflective multilayer (ML) structure, a capping layer, an absorption structure and a conductive material structure. The mask substrate has a front-side surface and a back-side surface. The reflective ML structure is positioned over the front-side surface of mask substrate. The capping layer is positioned over the reflective ML structure. The absorption structure is positioned over the capping layer. The conductive material structure is positioned over a sidewall surface of the mask substrate and a sidewall surface of the absorption structure.

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Patent Owner(s)

Patent OwnerAddress
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD8 LI-HSIN RD 6 HSINCHU SCIENCE PARK HSINCHU 300-78

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chang, Hsiao-Lun Tainan, TW 15 18
Chen, Li-Jui Hsinchu, TW 306 606
Cheng, Po-Chung Zhongpu Township, Chiayi County, TW 162 297
Fu, Tzung-Chi Miaoli, TW 70 299
Hsu, Che-Chang Taichung, TW 25 22
Kuo, Chueh-Chi Kaohsiung, TW 25 8
Lee, Tsung-Yen Jhudong Township, Hsinchu County, TW 41 177

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