Crystallisation of amorphous silicon from a silicon-rich aluminium substrate

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United States of America

PATENT NO 11282978
APP PUB NO 20190131485A1
SERIAL NO

16096992

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Abstract

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The invention relates to a method for manufacturing a semiconductor component comprising a thin layer of crystalline silicon on a substrate, comprising the steps of:

    providing a silicon-rich aluminum substrate (S0),depositing a thin layer of amorphous silicon on the substrate (S1), andapplying thermal annealing (S2) to the thin layer of amorphous silicon to obtain a thin layer of crystalline silicon on the substrate.

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Patent Owner(s)

Patent OwnerAddress
CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUEPARIS FRA
UNIVERSITE DE STRASBOURG4 RUE BLAISE PASCAL STRASBOURG 67000

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Bellanger, Pierre Strasbourg, FR 2 1
Slaoui, Abdelilah Truchtersheim, FR 1 0
Syvertsen, Freddy Oslo, NO 1 0
Ulyashin, Alexander Oslo, NO 6 330

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