Photomask
Number of patents in Portfolio can not be more than 2000
United States of America
Stats
-
Mar 22, 2022
Grant Date -
Mar 19, 2020
app pub date -
Nov 25, 2019
filing date -
Nov 25, 2019
priority date (Note) -
In Force
status (Latency Note)
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Abstract
A photomask includes a patterned photomask plate and a supporting member. The patterned photomask plate has a pattern region and a peripheral region surrounding the pattern region. The patterned photomask plate includes a plurality of openings in the pattern region. The supporting member directly abuts the patterned photomask plate and is in a peripheral region of the patterned photomask plate. The supporting member is formed from a different material than the patterned photomask plate.
First Claim
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International Classification(s)
Cited Art Landscape
Patent Citation Ranking
- 0 Citation Count
- G03F Class
- 0 % this patent is cited more than
- 3 Age
Maintenance Fees
| Fee | Large entity fee | small entity fee | micro entity fee | due date |
|---|---|---|---|---|
| 3.5 Year Payment | $1600.00 | $800.00 | $400.00 | Sep 22, 2025 |
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