Variable aperture mask
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United States of America
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Mar 8, 2022
Grant Date -
Aug 27, 2020
app pub date -
May 12, 2020
filing date -
May 12, 2020
priority date (Note) -
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status (Latency Note)
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Abstract
A collection system of a semiconductor metrology tool includes a chuck to support a target from which an optical beam is reflected and a spectrometer to receive the reflected optical beam. The collection system also includes a plurality of aperture masks arranged in a rotatable sequence about an axis parallel to an optical axis. Each aperture mask of the plurality of aperture masks is rotatable into and out of the reflected optical beam between the chuck and the spectrometer to selectively mask the reflected optical beam.
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