Film structure containing a photopolymer layer for holographic exposure and a coating layer of high resistance
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United States of America
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Mar 8, 2022
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N/A
app pub date -
May 8, 2018
filing date -
May 8, 2018
priority date (Note) -
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Abstract
The invention relates to a layer construction comprising a curable protective layer C and a photopolymer layer B, to a method for producing such a layer construction, to a method for producing a hologram using such a layer construction, to a sealed holographic medium and to the use of such a layer construction for producing a hologram.
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International Classification(s)
- C08J:WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTE....
- C08F:MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONL....
- G11B:INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BET....
- C08L:COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- G03H:HOLOGRAPHIC PROCESSES OR APPARATUS
- C08K:USE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUB....
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