Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates

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United States of America

PATENT NO 11264250
APP PUB NO 20200294813A1
SERIAL NO

16094381

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Abstract

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Use of a chemical mechanical polishing (CMP) composition (Q) for chemical mechanical polishing of a substrate (S) comprising (i) cobalt and/or (ii) a cobalt alloy, wherein the CMP composition (Q) comprises (A) Inorganic particles (B) an anionic surfactant of the general formula (I) R-S wherein R is C5-C20-alkyl, C5-C20-alkenyl, C5-C20-alkylacyl or C5-C20-alkenylacyl and S is a sulfonic acid derivative, an amino acid derivative or a phosphoric acid derivative or salts or mixtures thereof (C) at least one amino acid, (D) at least one oxidizer (E) an aqueous medium and wherein the CMP composition (Q) has a pH of from 7 to 10.

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Patent OwnerAddress
BASF SECARL-BOSCH-STRASSE 38 LUDWIGSHAFEN 67056

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Golzarian, Reza M Portland, US 20 56
Guevenc, Haci Osman Heidelberg, DE 20 32
Lan, Yongqing Ludwigshafen, DE 22 83
Lauter, Michael Mannheim, DE 35 113
Leunissen, Leonardus Veldhoven, NL 19 53
Proelss, Julian Worms, DE 24 54
Reichardt, Robert Ludwigshafen am Rhein, DE 15 40
Siebert, Max Ludwigshafen, DE 23 46
Usman, Ibrahim Sheik Ansar Heverlee, BE 13 74

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