Annular member, plasma processing apparatus and plasma etching method

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United States of America Patent

PATENT NO 11257662
APP PUB NO 20200066496A1
SERIAL NO

16545185

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Abstract

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An annular member is disposed to surround a pedestal for receiving a substrate in a plasma processing apparatus. The annular member contains quartz and silicon. A content percentage of the silicon in the quartz and the silicon is 2.5% or more and 10% and less by weight.

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Patent Owner(s)

Patent OwnerAddress
TOKYO ELECTRON LIMITED3-1 AKASAKA 5-CHOME MINATO-KU TOKYO 107-6325

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kazama, Koichi Miyagi, JP 17 243
Kitamura, Shingo Miyagi, JP 36 145
Nogami, Susumu Miyagi, JP 7 54
Ogasawara, Masahiro Miyagi, JP 41 1122
Sato, Tetsuji Miyagi, JP 33 1100

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