Diphasic gas/liquid plasma reactor

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 11253835
APP PUB NO 20180369778A1
SERIAL NO

16060605

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Abstract

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The present invention relates to a microfluidic or millifluidic device (1) comprising: —a support (2) made at least partially of a dielectric material, the support (2) comprising a first inlet (21a) adapted to be connected to a first reservoir containing gas, a second inlet (21b) adapted to be connected to a second reservoir containing liquid, an outlet (22) adapted to be connected to a receiver container containing gas and/or liquid, and a main microchannel or millichannel (3) present in the dielectric material allowing the liquid and the gas to flow from the inlets towards the outlet, —one or several ground electrode(s) (4) embedded in said dielectric material and extending along the main microchannel or millichannel (3), and —one or several high-voltage electrode(s) (5) embedded in said dielectric material and extending along the main microchannel or millichannel (3), wherein the high-voltage electrode(s) (5) and the ground electrode(s) (4) are located on opposite sides of the main microchannel or millichannel (3) so as to be able to generate an electric field inside the main microchannel or millichannel (3). The present invention relates also to a method for generating a plasma in a continuous manner using such a microfluidic or millifluidic device (1).

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Patent Owner(s)

Patent OwnerAddress
CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE (CNRS)3 RUE MICHEL ANGE PARIS 75016
PARIS SCIENCES ET LETTRES - QUARTIER LATIN75006 PARIS

International Classification(s)

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Ognier, Stéphanie Paris, FR 4 5
Tatoulian, Michael Paris, FR 5 8
Zhang, Mengxue Paris, FR 1 4

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