Stepped indirectly heated cathode with improved shielding

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United States of America Patent

PATENT NO 11244800
APP PUB NO 20210398765A1
SERIAL NO

17330801

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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An ion source for forming a plasma has a cathode with a cavity and a cathode surface defining a cathode step. A filament is disposed within the cavity, and a cathode shield has a cathode shield surface at least partially encircling the cathode surface. A cathode gap is defined between the cathode surface and the cathode shield surface, where the cathode gap defines a tortured path for limiting travel of the plasma through the gap. The cathode surface can have a stepped cylindrical surface defined by a first cathode diameter and a second cathode diameter, where the first cathode diameter and second cathode diameter differ from one another to define the cathode step. The stepped cylindrical surface can be an exterior surface or an interior surface. The first and second cathode diameters can be concentric or axially offset.

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Patent Owner(s)

Patent OwnerAddress
AXCELIS TECHNOLOGIES INC108 CHERRY HILL DRIVE BEVERLY MA 01915

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Bassom, Neil Hamilton, US 20 38
Farley, Marvin Ipswich, US 4 8
Platow, Wilhelm Newburyport, US 12 27
Satoh, Shu Byfield, US 35 164
Silverstein, Paul Arlington, US 8 210

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