Reflective mask and fabricating method thereof
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United States of America Patent
Stats
-
Feb 8, 2022
Grant Date -
Apr 30, 2020
app pub date -
Oct 17, 2019
filing date -
Oct 25, 2018
priority date (Note) -
In Force
status (Latency Note)
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Abstract
A reflective mask includes a substrate, a light absorbing layer over the substrate, a reflective layer over the light absorbing layer, and an absorption pattern over the reflective layer. The reflective layer covers a first portion of the light absorbing layer, and a second portion of the light absorbing layer is free from coverage by the reflective layer.
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International Classification(s)
Cited Art Landscape
Patent Citation Ranking
- 2 Citation Count
- G03F Class
- 72.42 % this patent is cited more than
- 3 Age
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