Laser apparatus including gas supply device and exhausting device
Number of patents in Portfolio can not be more than 2000
United States of America
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Feb 1, 2022
Grant Date -
Jan 31, 2019
app pub date -
Oct 3, 2018
filing date -
Oct 3, 2018
priority date (Note) -
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Abstract
A laser apparatus includes a controller that selects one of a first gas control and a second gas control based on gas pressure measured by a pressure sensor. The first gas control causes at least one of first laser gas and second laser gas is supplied to a chamber such that the gas pressure in the chamber after the first gas control is higher than the gas pressure in the chamber before the first gas control. The second gas control causes at least the first laser gas is supplied to the chamber and causes a part of the laser gas in the chamber is exhausted such that a difference between the gas pressure in the chamber before the second gas control and the gas pressure in the chamber after the second gas control is smaller than a difference between the gas pressure in the chamber before the first gas control and the gas pressure in the chamber after the first gas control.
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