Extreme ultraviolet light generating system and electronic device manufacturing method
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United States of America
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Jan 18, 2022
Grant Date -
Nov 19, 2020
app pub date -
Aug 7, 2020
filing date -
Aug 7, 2020
priority date (Note) -
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Abstract
An extreme ultraviolet light generating system includes a chamber; a target supply unit configured to successively output, toward a predetermined region in the chamber, a plurality of droplets including a first droplet and a second droplet of a target substance; a trajectory correcting laser apparatus configured to apply a trajectory correcting laser beam to each of the droplets moving from the target supply unit toward the predetermined region; a drive laser apparatus configured to apply a drive laser beam to each droplet having reached the predetermined region to generate plasma; and a control unit configured to control the trajectory correcting laser apparatus such that intensity of the trajectory correcting laser beam applied to the first droplet is different from intensity of the trajectory correcting laser beam applied to the second droplet.
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