Systems and methods for FRC plasma position stability

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United States of America

PATENT NO 11217351
APP PUB NO 20190141827A1
SERIAL NO

15976532

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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Systems and methods are provided that facilitate stability of an FRC plasma in both radial and axial directions and axial position control of an FRC plasma along the symmetry axis of an FRC plasma chamber. The systems and methods exploit an axially unstable equilibria of the FRC plasma to enforce radial stability, while stabilizing or controlling the axial instability. The systems and methods provide feedback control of the FRC plasma axial position independent of the stability properties of the plasma equilibrium by acting on the voltages applied to a set of external coils concentric with the plasma and using a non-linear control technique.

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Patent Owner(s)

Patent OwnerAddress
TAE TECHNOLOGIES INC19631 PAULING FOOTHILL RANCH CA 92610

International Classification(s)

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  • 2018 Application Filing Year
  • H05H Class
  • 354 Applications Filed
  • 239 Patents Issued To-Date
  • 67.52 % Issued To-Date
Click to zoom InYear of Issuance% of Matters IssuedCumulative IssuancesYearly Issuances20182019202020212022202320240255075100

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Gonzalez, Jesus Antonio Romero Foothill Ranch, US 3 5

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  • 3 Citation Count
  • H05H Class
  • 77.04 % this patent is cited more than
  • 3 Age
Citation count rangeNumber of patents cited in rangeNumber of patents cited in various citation count ranges2557601 - 10020406080100120140160180200220240260280

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