Signal line patterning for standard cells
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United States of America
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Dec 14, 2021
Grant Date -
Mar 4, 2021
app pub date -
Jun 5, 2020
filing date -
Jun 5, 2020
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Abstract
A four signal line unit cell is formed on a substrate using a combination of an extreme ultraviolet photolithography process and one or more self aligned deposition processes. The photolithography process and the self aligned deposition processes result in spacers on a hard mask above the substrate. The spacers define a pattern of signal lines to be formed on the substrate for a unit cell. The photolithography process and self aligned deposition processes result in signal lines having a critical dimension much smaller than features that can be defined by the extreme ultraviolet photolithography process.
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