Conductive film manufacturing method

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United States of America Patent

PATENT NO 11195635
APP PUB NO 20210082597A1
SERIAL NO

16954268

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Abstract

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Provided is a method for manufacturing a conductive film, including forming a coating of a composition that contains conductivity-imparting particles and photo-sintering the coating, wherein, prior to the photo-sintering of the coating, the coating is compressed in the thickness direction thereof. It is preferable that the coating be compressed at a temperature at which a binding agent contained in the composition shows a storage modulus of 100 MPa or less. It is also preferable that the coating be compressed so that the compression rate in the thickness direction is from 25% to 80%. It is preferable that, in the photo-sintering step, the light irradiation be performed through irradiation with pulsed light.

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Patent Owner(s)

Patent OwnerAddress
MITSUI MINING & SMELTING CO LTDSHINAGAWA-KU TOKYO 141-8584

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Anai, Kei Ageo, JP 15 57
Fukuzato, Shun Ageo, JP 2 0

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