Pneumatic support device and lithographic apparatus with pneumatic support device

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 11169450
APP PUB NO 20210080834A1
SERIAL NO

17050264

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Abstract

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The invention provides a pneumatic support device for a lithographic apparatus and a lithographic apparatus with such support device. The support device comprises a gas spring. The gas spring comprises a suspending part, a suspended part, and a pressure chamber configured for supporting the suspended part relative to the suspending part. The support device further comprises an actuator configured for positioning the suspended part relative to the suspending part, an acceleration sensor configured for generating a first sensor signal representative for the acceleration of the suspending part, a pressure sensor configured for generating a second sensor signal representative for the pressure in the pressure chamber, and a control unit. The control unit is configured to: receive the first sensor signal, receive the second sensor signal, filter the first sensor signal in a low-pass filter, filter the second sensor signal in a high-pass filter, determine, based on the filtered first sensor signal and filtered second sensor signal, a force exerted by the suspending part on the suspended part, and generate, based on said force, a control signal for the actuator.

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Patent Owner(s)

Patent OwnerAddress
ASML NETHERLANDS B VDE RUN 6501 VELDHOVEN NL - 5504 DR

International Classification(s)

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Butler, Hans Best, NL 166 2708
De, Beer Joep Sander Oss, NL 2 0
De, Hoon Cornelius Adrianus Lambertus Eindhoven, NL 22 109
Starreveld, Jeroen Pieter Knegsel, NL 14 88
Van, Duijnhoven Martinus Deurne, NL 12 46
Wijckmans, Maurice Willem Jozef Etiënne Eindhoven, NL 17 62

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