Induced stress for EUV pellicle tensioning
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United States of America Patent
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Nov 2, 2021
Grant Date -
Jun 25, 2020
app pub date -
Nov 5, 2019
filing date -
Dec 20, 2018
priority date (Note) -
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Abstract
A method for protecting a photomask comprises: (i) providing the photomask, (ii) providing a border, (iii) depositing at least two electrical contacts on the border, (iv) mounting a film comprising carbon nanotubes on the border such that the film comprises a free-standing part, wherein after the mounting and depositing steps, the electrical contacts are in contact with the film, (v) inducing a current through the free-standing part of the film by biasing at least one pair of the electrical contacts, and (vi) mounting the border on at least one side of the photomask with the free-standing part of the film above the photomask.
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