Epitaxial formation support structures and associated methods

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United States of America Patent

PATENT NO 11158764
APP PUB NO 20200243718A1
SERIAL NO

16846137

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Abstract

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Epitaxial formation support structures and associated methods of manufacturing epitaxial formation support structures and solid state lighting devices are disclosed herein. In several embodiments, a method of manufacturing an epitaxial formation support substrate can include forming an uncured support substrate that has a first side, a second side opposite the first side, and coefficient of thermal expansion substantially similar to N-type gallium nitride. The method can further include positioning the first side of the uncured support substrate on a first surface of a first reference plate and positioning a second surface of a second reference plate on the second side to form a stack. The first and second surfaces can include uniformly flat portions. The method can also include firing the stack to sinter the uncured support substrate. At least side of the support substrate can form a planar surface that is substantially uniformly flat.

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Patent Owner(s)

Patent OwnerAddress
MICRON TECHNOLOGY INC8000 SO FEDERAL WAY BOISE ID 83716-9632

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Sheen, Calvin Wade Derry, US 34 610

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