Interferometric waviness detection systems

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United States of America Patent

PATENT NO 11143503
SERIAL NO

16222636

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Abstract

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An interferometer detection system, including a beam splitter receiving a collimated light signal and splitting the signal into a first light signal and a second light signal. The system includes a first mirror receiving and reflecting the first light signal along a first path. The system includes a second mirror receiving and reflecting the second light signal along a second path via a transparent material. The system includes a 2D photosensor array configured to receive from the beam splitter the reflected first light signal merged with the reflected second light signal double passing through the transparent material and configured to generate an interference fringe pattern. A non-sinusoidal interference fringe pattern indicates geometrical variation between a wavefront of the reflected first light signal along the first path and a wavefront of the reflected second light signal double passing through the transparent material along the second path.

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Patent Owner(s)

Patent OwnerAddress
GLOBAL EQUIPMENT SERVICES AND MANUFACTURING INC5215 HELLYER AVE SUITE 130 SAN JOSE CA 95138

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Cheng, Yan San Jose, US 224 1347
Kim, Sangtaek Dublin, US 8 61

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