Method of producing etching mask, etching mask precursor, and oxide layer, and method of manufacturing thin film transistor
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United States of America Patent
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Sep 28, 2021
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N/A
app pub date -
Sep 27, 2019
filing date -
Apr 16, 2015
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Abstract
The etching mask 80 for screen printing according to one embodiment of the present invention includes aliphatic polycarbonate. Further, the method of producing an oxide layer (the channel 44) according to one embodiment of the present invention includes: an etching-mask forming step of forming a pattern of the etching mask 80 including aliphatic polycarbonate; a contact step of, after the etching-mask forming step, contacting the oxide layer with a solution for dissolving a portion of the oxide layer (the channel 44) which is not protected by the etching mask 80; and a heating step of, after the contact step, heating the oxide layer (the channel 44) and the etching mask 80 to or above a temperature at which the etching mask 80 is decomposed.
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