Fixture comprising magnetic means for holding rotary symmetric workpieces
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United States of America Patent
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Sep 28, 2021
Grant Date -
Feb 1, 2018
app pub date -
Feb 15, 2016
filing date -
Feb 13, 2015
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Abstract
A method for using a fixture system and a fixture system for holding workpieces or parts to be treated by a plasma assisted vacuum process, the fixture system including magnetic means which generate a magnetic field with a magnetic force which is high enough for holding the workpiece or part. The magnetic means of the fixture system are designed and arranged in such a manner that magnetic field lines of the generated magnetic field are largely confined to the space including the fixture system and the body of the workpiece or part, so that a generation of unintended plasma inhomogeneities caused by the magnetic field lines is avoided.
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