Substrate processing apparatus having a gas-mixing manifold
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United States of America Patent
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Sep 14, 2021
Grant Date -
Apr 16, 2020
app pub date -
Oct 11, 2018
filing date -
Oct 11, 2018
priority date (Note) -
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Abstract
A substrate processing apparatus includes a chamber, a manifold including a tubular portion above the chamber, first and second introduction pipes provided on a side surface of the tubular portion, and a gas guide portion to guide, in a direction opposite the chamber, gases introduced from the first and second introduction pipes into the tubular portion, and then introduce the gases into the chamber. The gas guide portion does not contact a top of the manifold, and the manifold includes a space above the gas guide portion to allow the gases to flow from between the gas guide portion and the tubular portion into a space surrounded by the gas guide portion. The gas guide portion advantageously enables the gases to broadly diffuse and uniformly mix, increasing the quality of a film formed on a substrate inside the chamber.
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