Processing apparatus, abnormality detection method, and storage medium

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United States of America Patent

PATENT NO 11094568
APP PUB NO 20180308730A1
SERIAL NO

15960800

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Abstract

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A processing apparatus includes a chamber configured to accommodate a substrate to be processed, a nozzle provided in the chamber and configured to supply a processing solution to the substrate, a flow rate measuring part configured to measure a flow rate of the processing solution supplied to the nozzle, a flow path opening/closing part configured to open and close a supply flow path of the processing solution to the nozzle, and a controller configured to output a close signal causing the flow path opening/closing part to perform a closing operation that closes the supply flow path. The controller is configured to detect an operation abnormality of the flow path opening/closing part based on an accumulated amount of the flow rate measured by the flow rate measuring part after outputting the close signal.

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Patent Owner(s)

Patent OwnerAddress
TOKYO ELECTRON LIMITED3-1 AKASAKA 5-CHOME MINATO-KU TOKYO 107-6325

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Ando, Ryoji Koshi, JP 31 50
Fukuda, Kousuke Koshi, JP 1 0
Komiya, Hiroshi Koshi, JP 25 133
Masaki, Youichi Koshi, JP 2 0
Morita, Satoshi Koshi, JP 60 521
Nakamizo, Kenji Koshi, JP 11 18
Nakashima, Mikio Koshi, JP 52 644
Sunaka, Ikuo Koshi, JP 9 43
Tanaka, Akinori Koshi, JP 71 830

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