Mirror, in particular for a microlithographic projection exposure apparatus or an inspection system
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United States of America Patent
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Aug 10, 2021
Grant Date -
Nov 7, 2019
app pub date -
Jul 17, 2019
filing date -
Jan 17, 2017
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Abstract
A mirror, in particular for a microlithographic projection exposure apparatus or an inspection system, having a mirror substrate (205), a reflection layer (220), which is configured to have a reflectivity of at least 50% for electromagnetic radiation of a predefined operating wavelength that is incident on the optically effective surface (200a) of the mirror at an angle of incidence of at least 65° relative to the respective surface normal, and a barrier layer system (210), which is arranged between the reflection layer and the mirror substrate and has a sequence of alternating layer plies composed of a first material and at least one second material. The barrier layer system reduces penetration of hydrogen atoms that would otherwise penetrate the mirror substrate by at least a factor of 10.
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