Chemistries for etching multi-stacked layers

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United States of America Patent

PATENT NO 11075084
APP PUB NO 20170365487A1
SERIAL NO

15692247

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Abstract

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Methods for fabricating a 3D NAND flash memory are disclosed. The method includes the steps of forming a hardmask pattern on the hardmask layer, and using the hardmask pattern to form apertures in the alternating layers by selectively plasma etching the alternating layers versus the hardmask layer using a hydrofluorocarbon etching gas selected from the group consisting of 1,1,1,3,3,3-hexafluoropropane (C3H2F6), 1,1,2,2,3,3-hexafluoropropane (iso-C3H2F6), 1,1,1,2,3,3,3-heptafluoropropane (C3HF7), and 1,1,1,2,2,3,3-heptafluoropropane (iso-C3HF7), wherein the first etching layer comprises a material different from that of the second etching layer.

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Patent Owner(s)

Patent OwnerAddress
L'AIR LIQUIDE SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDEPARIS FRANCE PARIS PARIS

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Gosset, Nicolas Grenoble, FR 5 25
Shen, Peng Ibaraki, JP 43 200
Urabe, Keiichiro Ibaraki, JP 3 27
Yokota, Jiro Ibaraki, JP 8 415

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