Compositions and processes for self-assembly of block copolymers

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United States of America Patent

PATENT NO 11067893
SERIAL NO

16468740

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Abstract

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The present invention relates to a novel styrenic polymer and to the novel composition comprised of this polymer and a solvent; wherein the styrenic polymer has a polydispersity from 1 to 1.3 and further wherein each polymer chain of the styrenic polymer is capped with one end group of structure 1), wherein, and L is a linking group selected from the group consisting of a direct valence bond, oxy (—O—), carbonyloxy, (—(C═O)—O—), carbonate (—O—(C═O)—O—); L2 is a C-1 to C-20 substituted or unsubstituted alkylene spacer, an arylene spacer or a direct valence bond, R, is hydrogen, a halide, a C-1 to C-20 alkyl moiety, or a C-1 to C-20 alkyloxy moiety, m is an integer from 1 to 3; and (I) represent the direct valence bond attaching the end group 1) to the end of the polymer chain of the styrenic polymer. In another aspect of this invention it pertains to the use of this composition to create self-assembly process.

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MERCK PATENT GMBHDARMSTADT

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Baskaran, Durairaj Bridgewater, US 15 12
Kim, JiHoon North Wales, US 189 871
Rahman, Md S Flemington, US 5 0
Shan, Jianhui Branchburg, US 28 331
Wu, Hengpeng Hillsborough, US 38 601

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