Liquid material vaporization and supply device, and control program
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United States of America Patent
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Jul 20, 2021
Grant Date -
N/A
app pub date -
Apr 13, 2018
filing date -
May 11, 2017
priority date (Note) -
In Force
status (Latency Note)
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Abstract
A liquid material vaporization and supply device is provided in which it is possible to accurately control a flow rate even in the case where calibration data is not available for a material gas. A first tank in which a liquid material is vaporized to produce material gas; a second tank in which the material gas is contained at a predetermined pressure; a pressure sensor that senses the pressure inside the second tank; a lead-out path for leading the material gas out of the second tank; a fluid control valve that is provided to open/close the lead-out path; and a flow rate control part that, when the material gas is led out through the lead-out path, on the basis of a reduction in the pressure sensed by the pressure sensor, controls the opening level of the valve to control the flow rate of the material gas are included.
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International Classification(s)
- C23C:COATING METALLIC MATERIAL; COATING MATERIAL WITH M....
- H01M:PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT....
- G05B:CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTION....
- G05D:SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC....
- B01J:CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS, CO....
- B01F:MIXING, e.g. DISSOLVING, EMULSIFYING, DISPERSING
- C02F:TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE....
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