Initiating and monitoring the evolution of single electrons within atom-defined structures

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United States of America Patent

PATENT NO 11047877
APP PUB NO 20200249256A1
SERIAL NO

16651480

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A method for the patterning and control of single electrons on a surface is provided that includes implementing scanning tunneling microscopy hydrogen lithography with a scanning probe microscope to form charge structures with one or more confined charges; performing a series of field-free atomic force microscopy measurements on the charge structures with different tip heights, where interaction between the tip and the confined charge are elucidated; and adjusting tip heights to controllably position charges within the structures to write a given charge state. The present disclose also provides a Gibb's distribution machine formed with the method for the patterning and control of single electrons on a surface. A multi bit true random number generator and neural network learning hardware formed with the above described method are also provided.

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Patent Owner(s)

  • QUANTUM SILICON INC.

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Dienel, Thomas Edmonton, CA 2 0
Huff, Taleana Edmonton, CA 6 1
Livadaru, Lucian Edmonton, CA 5 1
Rashidi, Mohammad Edmonton, CA 10 7
Retallick, Jacob Edmonton, CA 2 0
Vine, Wyatt Edmonton, CA 2 0
Walus, Konrad Edmonton, CA 11 47
Wolkow, Robert Edmonton, CA 6 185

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