Quantum dot film having porous structure and manufacturing method for the same

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United States of America Patent

PATENT NO 11043647
SERIAL NO

16212798

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The present disclosure relates to a quantum dot film including a self-assembled block copolymer, and a quantum dot bonded to the block copolymer, wherein the film has pores with an average diameter of 100-3000 nm inside.

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Patent Owner(s)

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KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGYDAEJEON 34141

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Choi, Jin Young Daejeon, KR 77 595
Jeon, Duk Young Daejeon, KR 5 9
Jung, Yeon Sik Daejeon, KR 16 206
Kim, Geon Yeong Daejeon, KR 6 20
Lee, Chul Hee Daejeon, KR 31 95
Lim, Hun Hee Daejeon, KR 12 3

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