Resist composition, method of forming resist pattern, and compound
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United States of America Patent
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Jun 15, 2021
Grant Date -
Jul 4, 2019
app pub date -
Dec 19, 2018
filing date -
Dec 28, 2017
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Abstract
A resist composition containing a compound (B1) represented by Formula (b1) in which Rb1 represents a monovalent hydrocarbon group which has a steroid skeleton and 17 to 50 carbon atoms, Yb1 and Yb2 each independently represent a divalent linking group having a hetero atom, Vb1 represents a divalent linking group containing a cyclic aliphatic hydrocarbon group, Vb2 represents an alkylene group, a fluorinated alkylene group, or a single bond, Rf1 represents a hydrogen atom, a fluorine atom, or a fluorinated alkyl group having 1 to 5 carbon atoms, m represents an integer of 1 or greater, and Mm+ represents an m-valent organic cation
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