Loadlock integrated bevel etcher system
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United States of America Patent
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Jun 8, 2021
Grant Date -
Jul 23, 2020
app pub date -
Apr 2, 2020
filing date -
Sep 24, 2015
priority date (Note) -
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Abstract
Implementations disclosed herein describe a bevel etch apparatus within a loadlock bevel etch chamber and methods of using the same. The bevel etch apparatus has a mask assembly within the loadlock bevel etch chamber. During an etch process, the mask assembly delivers a gas flow to control bevel etch without the use of a shadow frame. As such, the edge exclusion at the bevel edge can be reduced, thus increasing product yield.
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