DC magnetron sputtering

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United States of America Patent

PATENT NO 11008651
APP PUB NO 20170294294A1
SERIAL NO

15478283

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Abstract

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A DC magnetron sputtering apparatus is for depositing a film on a substrate. The apparatus includes a chamber, a substrate support positioned within the chamber, a DC magnetron, and an electrical signal supply device for supplying an electrical bias signal that, in use, causes ions to bombard a substrate positioned on the substrate support. The substrate support includes a central region surrounded by an edge region, the central region being raised with respect to the edge region.

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Patent Owner(s)

Patent OwnerAddress
SPTS TECHNOLOGIES LIMITEDNEWPORT

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Burgess, Steve Newport, GB 17 10
Haymore, Scott Newport, GB 15 13
Hyndman, Rhonda Newport, GB 13 16
Kendal, Chris Newport, GB 1 2
Moncrieff, Ian Wotton-under-Edge, GB 12 45
Rastogi, Amit Newport, GB 8 16

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