Apparatus and method for generating physical unclonable function by modifying photo mask of semiconductor process
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United States of America Patent
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May 11, 2021
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app pub date -
Aug 26, 2019
filing date -
Aug 27, 2013
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Abstract
Disclosed is a method of generating a physical unclonable function (PUF) by causing unpredictable partial process failure for a semiconductor process. In a designing process, a second mask pattern may be printed by distorting a size and/or shape of at least one mask window included in a designed first mask pattern, without violating semiconductor design rules. A PUF may be generated using a photomask including the printed second mask pattern for photolithography.
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