Method and system for adjusting the profile of a laser wavefront

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United States of America Patent

PATENT NO 10998691
APP PUB NO 20190221992A1
SERIAL NO

16250734

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Abstract

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A method and system for adjusting the profile of a laser wavefront formed by at least a laser beam to a desired laser wavefront profile, the laser beam or beams presenting random phases and intensities, comprises a mixing module, configured to generate, from interference phenomena among the laser beam or beams, a laser field, a second intensity measuring module configured to measure the mixed intensities of the laser field portions, a calculation unit configured to calculate one or several phase correction values of the phase of the laser beam or the phases of laser beams, from the intensities of the laser beams, the mixed intensities and one or several predetermined target phases, and a phase adjustment module configured to apply the phase correction value or values obtained from the calculation unit to the laser beam phases.

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Patent Owner(s)

Patent OwnerAddress
CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE (CNRS)3 RUE MICHEL ANGE PARIS 75016
COMPAGNIE INDUSTRIELLE DES LASERS CILASF-91460 MARCOUSSIS
UNIVERSITE DE LIMOGESHÔTEL DE L'UNIVERSITÉ 33 RUE FRANÇOIS MITTERRAND LIMOGES 87000

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Armand, Paul Limoges, FR 2 2
Barthelemy, Alain Limoges, FR 15 52
Benoist, Joël Limoges, FR 1 0
Desfarges-Berthelemot, Agnès Couzeix, FR 2 2
Kermene, Vincent Aixe-sur-Vienne, FR 6 10
Leval, Julien Saint-Pryvé-Saint-Mesmin, FR 1 0
Saucourt, Jérémy Limoges, FR 1 0

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