Method of forming a GaN single crystal comprising disposing a nucleation center in a first region, a GaN source material in a second region, and establishing a temperature distribution

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United States of America

PATENT NO 10975492
APP PUB NO 20190249328A1
SERIAL NO

16246065

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Abstract

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A method for growing a crystalline composition, the first crystalline composition may include gallium and nitrogen. The crystalline composition may have an infrared absorption peak at about 3175 cm−1, with an absorbance per unit thickness of greater than about 0.01 cm−1. In one embodiment, the composition ay have an amount of oxygen present in a concentration of less than about 3×1018 per cubic centimeter, and may be free of two-dimensional planar boundary defects in a determined volume of the first crystalline composition.

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Patent OwnerAddress
SLT TECHNOLOGIES INCC/O LOEB & LOEB 10100 SANTA MONICA BLVD SUITE 2200 LOS ANGELES CA 90067

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Cao, Xian-An Morgantown, US 14 965
D'Evelyn, Mark Philip Niskayuna, US 49 4716
Hong, Huicong Niskayuna, US 16 1910
Narang, Kristi Jean Voorheesville, US 27 1992
Park, Dong-Sil Niskayuna, US 49 2872
Zeng, Larry Qiang Strongsville, US 6 193

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