Method of cleaning substrate processing apparatus and system of cleaning substrate processing apparatus
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United States of America Patent
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Mar 16, 2021
Grant Date -
Jun 7, 2018
app pub date -
Nov 29, 2017
filing date -
Dec 2, 2016
priority date (Note) -
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Abstract
Disclosed is a method of cleaning a substrate processing apparatus in which a substrate having a surface wet by a liquid is brought into contact with a supercritical fluid so as to perform a drying process of drying the substrate. The method includes a cleaning gas filling process and an exhausting process. The cleaning gas filling process fills a cleaning gas containing isopropyl alcohol in the substrate processing apparatus. The exhausting process exhausts the cleaning gas from an inside of the substrate processing apparatus after the cleaning gas filling process.
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