Laser annealing method

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 10937651
SERIAL NO

16503330

Stats

ATTORNEY / AGENT: (SPONSORED)

Importance

Loading Importance Indicators... loading....

Abstract

See full text

A laser annealing method includes: step A of providing a substrate having an amorphous semiconductor film formed on a surface thereof; and step B of selectively irradiating a portion of the amorphous semiconductor film with laser light. The step B includes a step of simultaneously forming, in the portion, two molten regions that have elongate shapes congruent to each other and are arranged in line symmetry with each other.

Loading the Abstract Image... loading....

First Claim

See full text

Family

Loading Family data... loading....

Patent Owner(s)

Patent OwnerAddress
SAKAI DISPLAY PRODUCTS CORPORATION1 TAKUMICHO SAKAI-KU SAKAI-SHI OSAKA 590-8522

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Karatani, Kouichi Sakai, JP 2 0
Koiwa, Shinji Sakai, JP 6 5
Matsumoto, Takao Sakai, JP 59 585
Nodera, Nobutake Sakai, JP 31 846
Shinozuka, Akihiro Sakai, JP 4 5
Tanaka, Masakazu Sakai, JP 87 1431

Cited Art Landscape

Load Citation

Patent Citation Ranking

Forward Cite Landscape

Load Citation

Maintenance Fees

Fee Large entity fee small entity fee micro entity fee due date
7.5 Year Payment $3600.00 $1800.00 $900.00 Sep 2, 2028
11.5 Year Payment $7400.00 $3700.00 $1850.00 Sep 2, 2032
Fee Large entity fee small entity fee micro entity fee
Surcharge - 7.5 year - Late payment within 6 months $160.00 $80.00 $40.00
Surcharge - 11.5 year - Late payment within 6 months $160.00 $80.00 $40.00
Surcharge after expiration - Late payment is unavoidable $700.00 $350.00 $175.00
Surcharge after expiration - Late payment is unintentional $1,640.00 $820.00 $410.00