Charged particle beam apparatus using focus evaluation values for pattern length measurement
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United States of America Patent
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Feb 23, 2021
Grant Date -
Jan 31, 2019
app pub date -
Jul 19, 2018
filing date -
Jul 27, 2017
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Abstract
An object of the invention is to provide a charged particle beam apparatus which improves an efficiency of a beam scan at the time of performing a focus adjustment and a measurement or an inspection based on a signal obtained by the beam scan. In order to achieve the object described above, there is proposed a charged particle beam apparatus including a lens which focuses a charged particle beam on a sample, wherein focus evaluation values of a plurality of images are calculated which are obtained under different focus conditions by the lens, the images which are obtained by beam radiation with different focus conditions and in which a predetermined condition is satisfied are subject to a processing according to the focus evaluation values, and an integrated image is generated by integrating the processed images subject to the processing according to the focus evaluation values.
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