Substrate processing apparatus, substrate processing method, and storage medium
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United States of America Patent
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Feb 16, 2021
Grant Date -
May 16, 2019
app pub date -
Oct 19, 2018
filing date -
Oct 20, 2017
priority date (Note) -
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Abstract
A substrate processing apparatus according to an embodiment includes a substrate processing tank, a temperature adjustment unit, and a controller. The substrate processing tank is configured to perform an etching processing by immersing a substrate in a phosphoric acid processing liquid therein. The temperature adjustment unit is configured to adjust the temperature of the phosphoric acid processing liquid. The controller is configured to control the temperature adjustment unit to lower the temperature of the phosphoric acid processing liquid as the etching processing proceeds.
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