Pumping apparatus, treatment solution supplying device, substrate treating apparatus, liquid draining method, and liquid replacing method
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United States of America Patent
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Feb 16, 2021
Grant Date -
Feb 28, 2019
app pub date -
Jul 26, 2018
filing date -
Aug 31, 2017
priority date (Note) -
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Abstract
A chamber has at least three openings, or a first opening, a second opening, and a third opening formed therein that are in communication with a reservoir. The second opening is higher in level than the first opening. The third opening is used for discharging a liquid within the reservoir by introducing gas through at least one of the first opening and the second opening into the reservoir. Since the third opening is the lowest in level among the three openings, the liquid stored in the reservoir is able to be drained easily.
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