Sample holding mechanism, manufacturing method for same, and charged particle beam device
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United States of America Patent
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Dec 22, 2020
Grant Date -
Jan 24, 2019
app pub date -
Jul 9, 2018
filing date -
Jul 19, 2017
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Abstract
Continuous and automatic acquisition of electron beam holograms is made possible by using a sample holding mechanism that includes a sample end region that has a linear shape that is suited for electron beam holography, separates a thin-film rectangular window with an extreme-thin support film that supports a sample being disposed and a rectangular hole that has a linear-shaped edge and through which a reference wave is transmitted from each other, and configures a part of a layer that is thicker than the support film.
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