Injection apparatus and injection method for liquid sample for standard gas production

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United States of America Patent

PATENT NO 10871429
APP PUB NO 20190226950A1
SERIAL NO

16336818

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Abstract

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The purpose of the present invention is to provide an injection apparatus and an injection method for a liquid sample for standard gas production, wherein the injection apparatus for injecting a liquid sample present in a liquid state at room temperature into a standard gas container has an improved structure that minimizes the area in which the liquid sample directly contacts the injection apparatus so as to prevent the problem in which the liquid sample is adsorbed into the injection apparatus. Furthermore, another purpose of the present invention is to provide an injection apparatus and an injection method for a liquid sample for standard gas production, in which a step of volatilizing the remaining liquid sample by heating is eliminated during the injection of the liquid sample, thereby preventing the apparatus from being damaged by heating to thereby improve the durability of the apparatus.

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Patent Owner(s)

Patent OwnerAddress
KOREA RESEARCH INSTITUTE OF STANDARDS AND SCIENCE267 GAJEONG-RO YUSEONG-GU DAEJEON 34113 34113

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kang, Jihwan Gyeongsangnam-do, KR 1 0
Kim, Yong-Doo Daejeon, KR 1 0
Lee, Sangil Daejeon, KR 29 57

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