Plasma processing apparatus and plasma processing method
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Dec 8, 2020
Grant Date -
May 9, 2019
app pub date -
Jan 4, 2019
filing date -
Jun 30, 2014
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
A controller disclosed herein drives, in a first step, a high frequency generating source at a first energy condition, and drives, in a second step, a high frequency generating source at a second energy condition. Prior to a switching time of the first step and the second step, the controller switches gas species supplied from the gas supply system into the processing container, and sets a gas flow rate in an initial period just after the switching to be larger than a gas flow rate in a stabilization period after lapse of the initial period.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully